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| Subset | Description |
|---|---|
| Chemical Silicon Etch with Fluorine I | Set of reaction used in a feature profile model. Calibrated to match experimental profiles. |
| Chemical Silicon Etch with Fluorine II | Based on sticking coefficients calculated via molecular dynamics |
| Ion Assisted Silicon Etch in Chlorine | Used in a feature profile model. Calibrated to match experimental results |
| Ion Assisted Silicon Etch in Chlorine/Argon | Used in a feature profile model. Calibrated to match experimental results |
| Chemical Silicon Nitride Etch | Used in a surface site based model to match experimental etch rates in an Ar/NF$_3$/O$_2$ mixture |
| Silicon Dioxide Etch | Ion and polymer assisted silicon dioxide etch in flourocarbon discharge |