| Chemical Silicon Etch with Fluorine I |
Set of reaction used in a feature profile model.
Calibrated to match experimental profiles. |
| Chemical Silicon Etch with Fluorine II |
Based on sticking coefficients calculated via molecular dynamics |
| Ion Assisted Silicon Etch in Chlorine |
Used in a feature profile model. Calibrated to match experimental results |
| Ion Assisted Silicon Etch in Chlorine/Argon |
Used in a feature profile model. Calibrated to match experimental results |
| Chemical Silicon Nitride Etch |
Used in a surface site based model to match experimental etch rates in an Ar/NF$_3$/O$_2$ mixture |
| Silicon Dioxide Etch |
Ion and polymer assisted silicon dioxide etch in flourocarbon discharge |
