Surface data

Etching mechanisms

Surface reaction mechanisms and coefficient data used for plasma etching models.

Available surface data

6 surface data subsets

Etching Mechanisms

Etching reaction schemes to be used in site-based surface models or feature profile models

S2 Chemical Silicon Etch with Fluorine I Set of reaction used in a feature profile model. Calibrated to match experimental profiles. S6 Chemical Silicon Etch with Fluorine II Based on sticking coefficients calculated via molecular dynamics S9 Chemical Silicon Nitride Etch Used in a surface site based model to match experimental etch rates in an Ar/NF₃/O₂ mixture S7 Ion Assisted Silicon Etch in Chlorine Used in a feature profile model. Calibrated to match experimental results S8 Ion Assisted Silicon Etch in Chlorine/Argon Used in a feature profile model. Calibrated to match experimental results S16 Silicon Dioxide Etch Ion and polymer assisted silicon dioxide etch in flourocarbon discharge